[1] Rui Wang, Yixian Zhu, Sen Lu*, Kaiming Yang and Yu Zhu. Development of Overlay Target's Centre Positioning Algorithms Using Customizable Shape Fitting for High‐Precision Wafer Bonding. IET Image Processing, 2025, 19(1): e70020.
[2] 占韶伟, 周天, 鲁森, 杨开明, 朱煜, 周炯. 激光尖峰退火扫描轨迹及温控参数优化. 中国激光, 2025, 52(8): 0802402-9.
[3] 黄涛, 于春运, 陈宏枢, 鲁森*. 集成电路制造装备运动系统 LPV 动力学建模与控制综述. 动力学与控制学报, 2024, 22(12):5-17.
[4] Liang Zhang, Tao Huang, Sen Lu*, Kaiming Yang, Jing Chen and Jiong Zhou. Analysis of energy density and scanning speed impacts on Ni/SiC ohmic contacts during laser annealing. Materials Science in Semiconductor Processing, 2024, 184: 108760.
[5] Lei Cao, Sen Lu*, Kaiming Yang, Min Li, Tao Liu, and Shaowei Zhan. Data-driven sliding mode control with application to precision motion system. Proceeding of ASPE 2024 Annual Meeting, Houston, 2024.
[6] Shaowei Zhan, Sen Lu, Kaiming Yang, Yu Zhu and Lei Cao, Momentum-Enhanced Extremum Seeking Control for Advanced Controller Parameter Tuning. Proceeding of ASPE 2024 Annual Meeting, Houston, 2024.
[7] Lei Cao, Sen Lu*, Kaiming Yang, Ming Zhang and Yu Zhu. Optical interference phase control method with single photodetector for interference lithography. Optics Express, 2023, 31(24): 40086-40101.
[8] 李敏, 陈涛涛, 鲁森, 杨开明, 朱煜, 胡楚雄. 光刻机超精密运动台数据驱动MIMO定结构前馈控制, 机械工程学报, 2023, 59(21): 99-109.
[9] Jianhan Fan, Sen Lu, Jianxiao Zou, Kaiming Yang, Yu Zhu and Kaiji Liao. High-Precision Wafer Bonding Alignment Mark Using Moiré Fringes and Digital Grating. Micromachines, 2022, 13(12): 2159.
[10] Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, and Ming Zhang. Analysis and Design of Fringe Phase Control System for Scanning Beam Interference Lithography, Optical Engineering 60(6), 2021: 064107.
[11] Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, and Ming Zhang. Optimal Control for Stabilizing Fringe Phase in Interference Lithography. Proceedings of the IEEE 5th Optoelectronics Global Conference (OGC), Shenzhen, China, 2020.
[12] Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang and Jin Yang. Yaw error correction of ultra-precision stage for scanning beam interference lithography systems. Proceedings of the Institution of Mechanical Engineers, Part I: Journal of Systems and Control Engineering, 2018, 232(7):869-878.
[13] Sen Lu, Rong Chen, Kaiming Yang, Yu Zhu, Leijie Wang, and Ming Zhang. Real-time correction of periodic nonlinearity in homodyne detection for scanning beam interference lithography. Optical Engineering, 2018, 57(10):104107.
[14] Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, and Ming Zhang. Dynamic exposure model of scanning beam interference lithography. Proceedings of the ASME 2018 International Mechanical Engineering Congress & Exposition, Pittsburgh, USA, 2018.
[15] 鲁森, 杨开明, 朱煜, 王磊杰, 张鸣. 基于远场干涉的扫描干涉场曝光光学系统设计与分析. 光学学报, 2018, 38(06):43-51.
[16] 鲁森, 杨开明, 朱煜, 王磊杰, 张鸣. 扫描干涉场曝光中光栅掩模槽形轮廓的预测. 光学学报, 2018, 38(05):36-42.
[17] Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, and Ming Zhang. Real-time correction of nonlinearity error in homodyne phase-locking interferometer. Proceedings of the ASME 2017 International Mechanical Engineering Congress & Exposition, Tampa, USA, 2017.
[18] 鲁森, 杨开明, 朱煜, 王磊杰, 张鸣. 用于扫描干涉场曝光的超精密微动台设计与控制. 光学学报, 2017, 37(10):210-218.
[19] 鲁森, 杨开明, 朱煜, 王磊杰, 张鸣. 干涉条纹相位锁定系统. 光学精密工程, 2017, 25(01):1-7.
[20] 鲁森, 杨开明, 朱煜, 王磊杰, 张鸣. 干涉条纹相位锁定系统分析及其控制. 光子学报, 2017, 46(01):7-13.