[1] Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, and Ming Zhang. Analysis and Design of Fringe Phase Control System for Scanning Beam Interference Lithography, Optical Engineering 60(6), 2021: 064107.

[2] Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang and Jin Yang. Yaw error correction of ultra-precision stage for scanning beam interference lithography systems. Proceedings of the Institution of Mechanical Engineers, Part I: Journal of Systems and Control Engineering, 2018, 232(7):869-878.

[3] Sen Lu, Rong Chen, Kaiming Yang, Yu Zhu, Leijie Wang, and Ming Zhang. Real-time correction of periodic nonlinearity in homodyne detection for scanning beam interference lithography. Optical Engineering, 2018, 57(10):104107.

[4] Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, and Ming Zhang. Optimal Control for Stabilizing Fringe Phase in Interference Lithography. Proceedings of the IEEE 5th Optoelectronics Global Conference (OGC), Shenzhen, China, 2020.

[5] Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, and Ming Zhang. Dynamic exposure model of scanning beam interference lithography. Proceedings of the ASME 2018 International Mechanical Engineering Congress & Exposition, Pittsburgh, USA, 2018.

[6] Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, and Ming Zhang. Real-time correction of nonlinearity error in homodyne phase-locking interferometer. Proceedings of the ASME 2017 International Mechanical Engineering Congress & Exposition, Tampa, USA, 2017.

[7] 鲁森, 杨开明, 朱煜, 王磊杰, 张鸣. 基于远场干涉的扫描干涉场曝光光学系统设计与分析. 光学学报, 2018, 38(06):43-51.

[8] 鲁森, 杨开明, 朱煜, 王磊杰, 张鸣. 扫描干涉场曝光中光栅掩模槽形轮廓的预测. 光学学报, 2018, 38(05):36-42.

[9] 鲁森, 杨开明, 朱煜, 王磊杰, 张鸣. 用于扫描干涉场曝光的超精密微动台设计与控制. 光学学报, 2017, 37(10):210-218.

[10] 鲁森, 杨开明, 朱煜, 王磊杰, 张鸣. 干涉条纹相位锁定系统. 光学精密工程, 2017, 25(01):1-7.

[11] 鲁森, 杨开明, 朱煜, 王磊杰, 张鸣. 干涉条纹相位锁定系统分析及其控制. 光子学报, 2017, 46(01):7-13.